铜电致化学抛光抛光液的成分及其作用
单坤, 周平, 蔡吉庆, 康仁科, 郭东明
Chemical Components and Its Functions of Polishing Solution Used in Electrogenerated Chemical Polishing of Copper
SHAN Kun, ZHOU Ping, CAI Jiqing, KANG Renke, GUO Dongming
机械工程学报
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2016, (5): 88
-94
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DOI: 10.3901/JME.2016.05.088
