Ablation Threshold and Material Removal Mechanisms of SiC Processed by Femtosecond Laser

ZHAO Qingliang;JIANG Tao;DONG Zhiwei;FAN Rongwei;YU Xin;LUO Jian

Journal of Mechanical Engineering ›› 2010, Vol. 46 ›› Issue (21) : 172-177.

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Journal of Mechanical Engineering ›› 2010, Vol. 46 ›› Issue (21) : 172-177.
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Ablation Threshold and Material Removal Mechanisms of SiC Processed by Femtosecond Laser

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2010, 46(21): 172-177

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