Chemical Components and Its Functions of Polishing Solution Used in Electrogenerated Chemical Polishing of Copper

SHAN Kun, ZHOU Ping, CAI Jiqing, KANG Renke, GUO Dongming

Journal of Mechanical Engineering ›› 2016, Vol. 52 ›› Issue (5) : 88-94.

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Journal of Mechanical Engineering ›› 2016, Vol. 52 ›› Issue (5) : 88-94. DOI: 10.3901/JME.2016.05.088

Chemical Components and Its Functions of Polishing Solution Used in Electrogenerated Chemical Polishing of Copper

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2016, 52(5): 88-94 https://doi.org/10.3901/JME.2016.05.088

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