基于动磁场磁流变效应抛光方法，采用微型压电式传感器测试分析动磁场磁流变效应抛光垫法向抛光力特性，研究磁极转速、加工间隙、工件运动方式对动磁场磁流变效应抛光力的影响。结果表明，动磁场磁流变效应平面抛光法向力在抛光垫中心区域最大，pv值在抛光垫的半径6 mm处最大；相对静磁场，在磁极转动的动磁场作用下磁流变抛光力和扭矩呈现大幅度波动的动态行为；动磁场磁流变效应抛光力受到磁极转速影响，大于15 r/min开始产生动磁场，在试验所测得的范围内，磁极转速30 r/min左右有最好效果；工件运动方式是影响磁流变抛光作用力的因素，当工件沿抛光盘径向往复偏摆时扭矩剧烈变化，沿抛光盘法向运动加工间隙减小时抛光法向力会瞬间急剧增大，最大峰值达到稳态值的25倍。
Based on the dynamic magnetic field magnetorheological effect(DMFME) polishing technology, the characteristics of polishing normal force of DMFME polishing pad is tested and analyzed by the micro piezoelectric sensor. The influences of the revolving speeds of magnetic pole, the machining gaps, the movement methods of workpiece on the polishing force are researched. It is found that the maximal MR effect plane polishing normal force of DMFME appeared on the central zone, but the maximal pv value came up in the radius of 6 mm. Compared with the static magnetic field, the MR polishing force and the torque presented significant dynamic behavior under the dynamic magnetic field formed by the rotating magnetic pole. The dynamic magnetic field became more remarkable when the revolving speed of magnetic pole greater than 15 r/min, and the best DMFME is acquired when the speed is 30 r/min. The movement methods of workpiece also affected the DMFME polishing force. The torque is varied violently when the workpiece oscillated along the polishing plate. The normal force of DMFME polishing drastically increased when the machining gaps is reduced, its maximum peak reached 25 times of the steady state value.
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