数字化设计与制造

纳米压印复合软模具建模研究

  • 丁雅斌 ,
  • 梅江平 ,
  • 张文昌 ,
  • 刘晓利 ,
  • 李延强 ,
  • 兰红波 ,
  • 许权 ,
  • 梁森 ,
  • 刘红忠
展开
  • 1. 青岛理工大学纳米制造与纳光电子实验室 青岛 266033;
    2. 西安交通大学机械制造系统工程国家重点实验室 西安 710049
李延强,男,1992年出生。主要研究方向为微纳制造、大面积纳米压印、微纳尺度3D打印、光电子器件制造。E-mail:yqlee25@126.com

收稿日期: 2017-10-21

  修回日期: 2018-03-15

  网络出版日期: 2018-10-05

基金资助

国家自然科学基金重大研究计划(91023023)、国家自然科学基金(51775288,51375250)和山东省重点研发计划(2018GGX103022)资助项目。

Modeling of Flexible Composite Mold for Nanoimprint Lithography

  • DING Yabin ,
  • MEI Jiangping ,
  • ZHANG Wenchang ,
  • LIU Xiaoli ,
  • LI Yanqiang ,
  • LAN Hongbo ,
  • XU Quan ,
  • LIANG Sen ,
  • LIU Hongzhong
Expand
  • 1. Nanomanufacturing and Nano-Optoelectronics Lab, Qingdao Technological University, Qingdao 266033;
    2. State Key Laboratory for Manufacturing System Engineering, Xi'an Jiao Tong University, Xi'an 710049

Received date: 2017-10-21

  Revised date: 2018-03-15

  Online published: 2018-10-05

摘要

基于复合软模具纳米压印是一种高效、低成本和批量化制造大面积微纳米结构的新方法,已经被看作是最具有工业化应用前景的微纳制造技术。大尺寸复合软模具的设计和制造是当前大面积纳米压印所面临的一项挑战性难题,也是影响和制约晶圆级微纳米压印广泛工业化应用的技术瓶颈。开展了大面积纳米压印复合软模具理论分析、数值模拟和试验验证的系统研究。基于薄板弯曲理论,建立复合软模具变形理论模型。利用ABAQUS模拟软件,揭示了模具几何特征、材料属性以及压印工艺要素对于复合软模具变形的影响及其规律。提出纳米压印复合软模具设计的基本准则。该研究为大面积纳米压印复合软模具设计、优化和制造奠定了重要理论基础,并为大面积纳米压印装备开发和工艺优化提供方向性指导。

本文引用格式

丁雅斌 , 梅江平 , 张文昌 , 刘晓利 , 李延强 , 兰红波 , 许权 , 梁森 , 刘红忠 . 纳米压印复合软模具建模研究[J]. 机械工程学报, 2018 , 54(19) : 170 -181 . DOI: 10.3901/JME.2018.19.170

Abstract

Large-area nanoimprint lithography using flexible molds is an emerging nanopatterning approach for mass producing large-area micro/nano scale structures with low cost, high throughput and high resolution. Design and manufacturing of flexible composite molds have been considered as the most challenging issues for large-area NIL process, and a bottleneck hindering the industrialization of large-area NIL. The theoretical model, numerical simulation and experimental verification for flexible composite molds implementing large-area nanoimprinting are investigated. A theoretical model which can predict the deformation of flexible molds and determine suitable thickness of composite stamps is proposed. Furthermore, the effects of the thickness, the material properties, imprinting pressure for the flexible composite molds are revealed by numerical simulation using ABAQUS software. The mechanism and rule of the mold deformation are also discussed in detailed. Some fundamental design rules for flexible composite molds are put forwarded. These findings are valuable in providing a theoretical basis for designing and optimizing of flexible composite molds, and further enhancing the performance of large-area NIL process and tool.

参考文献

[1] CHOU S Y,KRAUSS P R,RENSTROM P J. Imprint lithography with 25-nanometer resolution[J]. Science,1996,272(5258):85-87.
[2] HUA F,SUN Y,GAUR A,et al. Polymer imprint lithography with molecularscale resolution[J]. Nano Letters,2004,4(12):2467-2471.
[3] LAN H,DING Y,LIU H. Nanoimprint lithography:Principles,processes and materials[M]. New York:Nova Science Publishers,2011.
[4] 兰红波,徐方超,李增辉,等. 滚型纳米压印模具变形机理的研究[J]. 机械工程学报,2015,51(7):155-161. LAN Hongbo,XU Fangchao,LI Zenghui,et al. Mold deformation in roller-type nanoimprint lithography[J]. Journal of Mechanical Engineering,2015,51(7):155-161.
[5] VERSCHUUREN M. Substrate conformal imprint lithography for nanophotonics[D]. Utrecht:Utrecht University,2010.
[6] AHN S,GUO L. Large-area toll-to-roll and roll-to-plate nanoimprint lithography:A step toward high-throughput application of continuous nanoimprinting[J]. ACS NANO,2009,3(8):2304-2310.
[7] JI R,HORNUNG M,VERSCHUUREN M,et al. UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing[J]. Microelectronic Engineering,2010,87(5-8):963-967.
[8] EV Group. Displays,Biotechnology and Photonic applications trigger demand for large-area nanoimprint system[EB/OL].[2017-12-10]. http://www.evgroup.com/en/about/news/2016_03_EVG7200LA/.
[9] LAN H,LIU H. UV-nanoimprint lithography:Structure,materials and fabrication of flexible molds[J]. Journal of Nanoscience and Nanotechnology,2013,13:3145-3172.
[10] SCHIFT H. Nanoimprint lithography:2D or not 2D? A review[J]. Applied Physics A,2015,121(2):415-435.
[11] 李增辉,兰红波,刘红忠,等.大面积纳米压印揭开式脱模建模与模拟[J].中国科学:技术科学,2014,44(10):1087-1096. LI Zenghui,LAN Hongbo,LIU Hongzhong,et al. Theory and simulations of peel demolding for large-area nanoimprint lithography[J]. Sci. Sin. Tech.,2014,44(10):1087-1096.
[12] MCCLELLAND G,RETTNER C,HART M,et al. Contact mechanics of a flexible imprinter for photocured nanoimprint lithography[J]. Tribology Letters. 2005,19(1):59-63.
[13] PAPENHEIM M,EIDENULLER W,WANG S,et al. Reducing the risk of failure with flexible composite stamps[J]. Microelectronic Engineering,2016,155:79-84.
[14] SONNEA M,SMISTRUP K,HANNIBAL M,et al. Modeling and simulation of the deformation process of PTFE flexible stamps for nanoimprint lithography on curved surfaces[J]. Journal of Materials Processing Technology,2015,216:418-429.
[15] 徐芝纶. 弹性力学[M]. 北京:高等教育出版社,2006. XU Zhilun. Mechanics of elasticity[M]. Beijing:Higher Education Press,2006.
[16] KIM K S,KIM J H,LEE H J,et al. Tribology issues in nanoimprint lithography[J]. Journal of Mechanical Science and Technology,2010,24:5-12.
[17] 刘鸿文. 材料力学[M]. 北京:高等教育出版社,2011. LIU Hongwen. Mechanics of materials[M]. Beijing:Higher Education Press,2011.
文章导航

/