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ISSN 1674-5949 CN 31-2023/U
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中文
Effects of Current Density on Residual Resistivity Ratio of Electrodeposited Copper Films
ZHANG Shuai, LUO Jirun, WANG Xiaoxia, ZHANG Rui, WU Zhijie, FENG Haijiao
China Surface Engineering . 2021, (
4
): 60 -66 . DOI: 10.11933/j.issn.1007-9289.20210201001
