Optimizing Process Parameters of Atomizing CMP on Silicon Nitride Ceramics Substrate

doi:10.3969/j.issn.0254-0150.2017.11.018

LI Qingzhong, GAO Yuankui, ZHU Qiang

Lubrication Engineering ›› 2017, Vol. 42 ›› Issue (11) : 95-99.

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Lubrication Engineering ›› 2017, Vol. 42 ›› Issue (11) : 95-99. DOI: 10.3969/j.issn.0254-0150.2017.11.018

Optimizing Process Parameters of Atomizing CMP on Silicon Nitride Ceramics Substrate

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2017, 42(11): 95-99 https://doi.org/10.3969/j.issn.0254-0150.2017.11.018

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Received	Published
2017-01-14	2017-11-15
Issue Date
2019-12-17

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