Process optimization and performance of plasma enhanced chemical vapor deposition for preparing silicon nitride thin films

ZHANG Zhi-kun, ZHAN Qin, DOU Zhi-ang, BAI Jing-yuan, YANG Hong-guang

Transactions of Materials and Heat Treatment ›› 2023, Vol. 44 ›› Issue (8) : 149-155.

PDF(1212 KB)
PDF(1212 KB)
Transactions of Materials and Heat Treatment ›› 2023, Vol. 44 ›› Issue (8) : 149-155. DOI: 10.13289/j.issn.1009-6264.2023-0183

Process optimization and performance of plasma enhanced chemical vapor deposition for preparing silicon nitride thin films

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +
History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2023, 44(8): 149-155 https://doi.org/10.13289/j.issn.1009-6264.2023-0183

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}
PDF(1212 KB)

Accesses

Citation

Detail
Sections
Recommended
　 Copyright © Transactions of Materials and Heat Treatment, All Rights Reserved.
Powered by Beijing Magtech Co. Ltd,.

/

〈 〉