抛光液中离子浓度对化学机械抛光过程的影响

林广川，郭丹，解国新，潘国顺

Influence of Ionic Concentration of Slurry on Process of Chemical Mechanical Polishing

LIN Guangchuan, GUO Dan, XIE Guoxin, PAN Guoshun

中国表面工程 . 2015, (4): 54 -61 . DOI: 10.11933/j.issn.1007-9289.2015.04.007