贵金属溅射靶材的研究进展

doi:10.11973/jxgccl202108002

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Abstract Sputtering targets are the key raw materials for the preparation of thin films by magnetron sputtering, and their quality determines the performance of the sputtered thin films. Precious metal sputtering targets are widely used in the preparation of high-performance thin films because of their excellent physical and chemical properties. The research progress on the preparation methods, technical requirements and application of precious metal sputtering targets is reviewed. The development direction of high purity, large size, high utilization rate, and integrated development of target production and sputtering film is put forward.

Key words： precious metal sputtering target thin film preparation method application

Received: 18 January 2021 Published: 23 August 2021

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TG146.3

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	Articles by authors
	XU Yanting
	GUO Junmei
	WANG Chuanjun
	SHEN Yue
	GUAN Weiming
	WEN Ming

Cite this article:

XU Yanting,GUO Junmei,WANG Chuanjun, et al. Research Progress on Precious Metal Sputtering Target[J]. Materials For Mechanical Engineering, 2021, 45(8): 8-14,102.

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http://qikan.cmes.org/jxgccl/EN/10.11973/jxgccl202108002 OR http://qikan.cmes.org/jxgccl/EN/Y2021/V45/I8/8

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